Monotype and Chine Collé with a Side of Photopolymer: Weeklong Intensive with Ron Pokrasso (June 9-13, 2025)

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Week-long Summer Workshop

Class dates: June 9-13, 2025 from 10am–5pm (with a lunch break)

Class fee:  $950 + tax

Ron Pokrasso’s approach to monotype in combination with chine collé/collage and photopolymer platemaking will open your eyes and working process to a whole new range of possibilities.

Ron encourages students to think in layers, where many options become available in one or more impressions. With a monotype plate in the works you may decide to incorporate a background plate,  a chine collé element or a photopolymer plate. With so many surfaces, your options will become endless and the mixing and matching of imagery will have the potential to move you into exciting new directions. Using Akua non-toxic products Pokrasso will demonstrate numerous methods to working with inks and tools.

The workshop includes a section on photopolymer plate-making. He will guide you in the preparation of the transparency and plate and will show how to best integrate repeatable imagery into unique compositions. He will guide you through registration methods to be able to use multiple plates with perfection. Using dry paper you will enjoy the immediacy of reworking the surface and the ease in coming back days later to works in progress.

This workshop is an overview of many of the different short classes presented at Remarque but with Pokrasso’s unique approaches interspersed with art making philosophies and combined into one intensive, enriching, eco-friendly week long art immersion.

This workshop is suitable to all levels of experience.